UK-SRP | News
Andrew Lynch Receives Prestigious Gates Cambridge Scholarship

(Feb. 2008) - Andrew Lynch, a senior chemical engineering student who works in Dr. D.B. Bhattacharrya's lab, has been awarded a Gates Cambridge Scholarship.

An undergraduate researcher on the NIEHS-SRP project (and also as a Beckman Scholar), Lynch has been dealing with chelate modified free radical reaction for TCE destruction. He is the first to investigate the novel use of ion exchange beads to entrap Fe(II) for subsequent free radical formation through the use of H2O2. He previously received an award at the American Institute for Chemical Engineers annual meeting for his research. In addition, he has maintained a perfect 4.0 GPA as an undergraduate.

Lynch is the first University of Kentucky student ever to receive this prestigious scholarship. He has a strong interest in the environmental area of research and plans to use the scholarship to pursue a PhD in Chemical Engineering at Cambridge University.

According to the Gates Foundation, 40 US scholars were selected from 128 finalists and over 600 first-round applicants for the Gates Cambridge Scholarship.